FAST LR(k) ANALYSIS
نویسنده
چکیده
منابع مشابه
Fast and non-destructive determination of active-layer thickness of LR 115 SSNTD using a color commercial document scanner
Measurements using the LR 115 solid-state nuclear track detector (SSNTD) depend critically on the removed thickness of the active layer during etching, which cannot be controlled by the etching period alone. For example, the bulk etch rate depends significantly on the strength of stirring during etching. We propose here a fast, inexpensive and nondestructive method based on a color commercial d...
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Recognizing genes with distinctive expression levels can help in prevention, diagnosis and treatment of the diseases at the genomic level. In this paper, fast Global k-means (fast GKM) is developed for clustering the gene expression datasets. Fast GKM is a significant improvement of the k-means clustering method. It is an incremental clustering method which starts with one cluster. Iteratively ...
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LR-parsing Kyung-Goo Doh, Hyunha Kim, David A. Schmidt 1 Hanyang University, Ansan, South Korea 2 Kansas State University, Manhattan, Kansas, USA Abstract. We combine LR(k)-parsing technology and data-flow analysis to analyze, in advance of execution, the documents generated dynamically by a program. Based on the document language’s context-free reference grammar and the program’s control struc...
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parsing with string updates using LR-parsing technology Kyung-Goo Doh, Hyunha Kim, David A. Schmidt 1 Hanyang University, Ansan, South Korea 2 Kansas State University, Manhattan, Kansas, USA Abstract. We combine LR(k)-parsing technology and data-flow analysis to analyze, in advance of execution, the documents generated dynamically by a program. Based on the document language’s context-free refe...
متن کاملA fast method to measure the thickness of removed layer from etching of SSNTD based on EDXRF
Solid state nuclear track detectors are commonly used for measurements of concentrations of radon gas and/or radon progeny. All these measurements depend critically on the thickness of the removed layer during etching. However, the thickness of removed layer calculated using the etching period does not necessarily provide a su7ciently accurate measure of the thickness. For example, the bulk etc...
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